In an extrinsic semiconductor, the hole concentration is given to be 1.5$$n_i$$ where $$n_i$$ is the intrinsic carrier concentration of 1 $$\times$$ 10$$^{10}$$ $$cm^{-3}$$. The ratio of electron to hole mobility for equal hole and electron drift current is given as ___________ (rounded off to two decimal places).

In a semiconductor device, the Fermi-energy level is 0.35 eV above the valence band energy. The effective density of states in the valence band at T = 300 K is 1 $$\times$$ 10$$^{19}$$ cm$$^{-3}$$. The thermal equilibrium hole concentration in silicon at 400 K is _____________ $$\times$$ 10$$^{13}$$ cm$$^{-3}$$ (rounded off to two decimal places).

Given kT at 300 K is 0.026 eV.

Select the CORRECT statements regarding semiconductor devices

A bar of silicon is doped with boron concentration of $10^{16} \mathrm{cm}^{-3}$ and assumed to be fully ionized. It is exposed to light such that electron-hole pairs are generated throughout the volume of the bar at the rate of $10^{20} \mathrm{~cm}^{-2} \mathrm{~s}^{-1}$. If the recombination lifetime is $100 \mu \mathrm{~s}$, intrinsic carrier concentration of silicon is $10^{10} \mathrm{~cm}^{-3}$ and assuming $100 \%$ ionization of boron, then the approximate product of steady-state electron and hole concentrations due to this light exposure is