1
GATE ECE 2005
MCQ (Single Correct Answer)
+1
-0.3
The primary reason for the widespread use of Silicon in semiconductor device technology is
A
abundance of Silicon on the surface of the Earth.
B
larger bandgap of Silicon in comparison to Germanium.
C
favorable properties of Silicon-dioxide (SiO2)
D
lower melting point
2
GATE ECE 2005
MCQ (Single Correct Answer)
+2
-0.6
A silicon sample 'A' is doped with 1018 atoms/cm3 of Boron. Another sample 'B' of identical dimensions is doped with 1018 atoms/cm3 of Phosphorus. The ratio of electron to hole mobility is 1/3. The ratio of conductivity of the sample A to B is
A
3
B
1/3
C
2/3
D
3/2
3
GATE ECE 2005
MCQ (Single Correct Answer)
+1
-0.3
A MOS capacitor made using p-type substrate is in the accumulation mode. The dominant charge in the channel is due to the presence of
A
holes
B
electrons
C
positively charged ions
D
negatively charged ions
4
GATE ECE 2005
MCQ (Single Correct Answer)
+2
-0.6
The Dirac delta Function $$\delta \left( t \right)$$ is defined as
A
$$\delta \left( t \right) = \left\{ {\matrix{ 1 & {t = 0} \cr {0\,{\,^,}} & {otherwise} \cr } } \right.$$
B
$$\delta \left( t \right) = \left\{ {\matrix{ \infty & {t = 0} \cr {0\,\,,} & {otherwise} \cr } } \right.$$
C
$$\delta \left( t \right) = \left\{ {\matrix{ 1 & {t = 0} \cr {0\,\,,} & {otherwise} \cr } } \right.$$ and $$\int\limits_{ - \infty }^\infty {\delta \left( t \right)\,dt = 1} $$
D
$$\delta \left( t \right) = \left\{ {\matrix{ \infty & {t = 0} \cr {0\,\,,} & {otherwise} \cr } } \right.$$ and $$\int\limits_{ - \infty }^\infty {\delta \left( t \right)\,dt = 1} $$