For non-degenerately doped n-type silicon, which one of the following plots represents the temperature ($T$) dependence of free electron concentration ($n$)?

The free electron concentration profile $n(x)$ in a doped semiconductor at equilibrium is shown in the figure, where the points A, B, and C mark three different positions. Which of the following statements is/are true?

Consider a MOS capacitor made with p-type silicon. It has an oxide thickness of 100 nm, a fixed positive oxide charge of $10^{-8}$ C/cm² at the oxide-silicon interface, and a metal work function of 4.6 eV. Assume that the relative permittivity of the oxide is 4 and the absolute permittivity of free space is $8.85 × 10^{-14}$ F/cm. If the flatband voltage is 0 V, the work function of the p-type silicon (in eV, rounded off to two decimal places) is ______.

A non-degenerate n-type semiconductor has 5 % neutral dopant atoms. Its Fermi level is located at 0.25 eV below the conduction band ($E_C$) and the donor energy level ($E_D$) has a degeneracy of 2. Assuming the thermal voltage to be 20 mV, the difference between $E_C$ and $E_D$ (in eV, rounded off to two decimal places) is _______.