A thin P-type silicon sample is uniformly illuminated with light which generates excess carriers. The recombination rate is directly proportional to

In MOSFET fabrication, the channel length is defined during the process of

An ideal MOS capacitor has boron doping concentration of 10¹⁵ cm^-3 in the substrate. When a gate voltage is applied, a depletion region of width 0.5 $$\mu m$$ is formed with a surface (channel) potential of 0.2V. Given that $${\varepsilon _0} = 80854 \times {10^{ - 14}}F/cm$$ and the relative permittivities of silicon and silicon dioxide are 12 and 4, respectively, the peak electric field (in V/ $$\mu m$$ ) in the oxide region is ______

For the MOSFET M₁ shown in the figure, assume W/L =2, V_DD = 2.0 V, $$\mu n$$ C_OX = 100$$\mu {\rm A}/{V^2}$$ and V_TH =0.5 V. The transistor M₁ switches from saturation region to linear regionm when V_in(in Volts) is _____