1
GATE ECE 2014 Set 2
MCQ (Single Correct Answer)
+1
-0.3
In CMOS technology, shallow P-well or N-well regions can be formed using
A
low pressure chemical vapour deposition
B
low energy sputtering
C
low temperature dry oxidation
D
low energy ion-implantation
2
GATE ECE 2014 Set 2
MCQ (Single Correct Answer)
+2
-0.6
For the n-channel MOS transistor shown in the figure, the threshold voltage VTh is 0.8V. Neglect channel length modulation effects. When the drain voltage VD = 1.6 V, the drain current ID was found to be 0.5 mA. GATE ECE 2014 Set 2 Electronic Devices and VLSI - IC Basics and MOSFET Question 23 English
A
0.625
B
0.75
C
1.125
D
1.5
3
GATE ECE 2014 Set 2
Numerical
+2
-0
For the MOSFETs shown in the figure, the threshold voltage |Vt| = 2V and
K=$${1 \over 2}\mu {C_{OX}}\left( {{W \over L}} \right) = 0.1mA/{V^2}$$ . The value of ID (in mA) is _______ GATE ECE 2014 Set 2 Electronic Devices and VLSI - IC Basics and MOSFET Question 22 English
Your input ____
4
GATE ECE 2014 Set 2
MCQ (Single Correct Answer)
+1
-0.3
The system of linear equations $$\left( {\matrix{ 2 & 1 & 3 \cr 3 & 0 & 1 \cr 1 & 2 & 5 \cr } } \right)\left( {\matrix{ a \cr b \cr c \cr } } \right) = \left( {\matrix{ 5 \cr { - 4} \cr {14} \cr } } \right)$$ has
A
a unique solution
B
infinitely many solutions
C
no solution
D
exactly two solutions
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