Consider an abrupt PN junction (at T = 300 K) shown in the figure. The depletion region width X_n on the N-side of the junction is 0.2 µm and the permittivity of silicon (ε_si) is 1.044×10^-12 F/cm. At the junction, the approximate value of the peak electric field (in kV/cm) is _________.

An increase in the base recombination of a BJT will increase

In CMOS technology, shallow P-well or N-well regions can be formed using

For the MOSFETs shown in the figure, the threshold voltage |V_t| = 2V and
K=$${1 \over 2}\mu {C_{OX}}\left( {{W \over L}} \right) = 0.1mA/{V^2}$$ . The value of I_D (in mA) is _______